Polishing pad for substrate polishing apparatus



FIG. 1 is a top plan view of a first embodiment of a polishing pad forsubstrate polishing apparatus, showing our new design;

FIG. 2 is a bottom plan view thereof;

FIG. 3 is a front view thereof, the rear view being identical;

FIG. 4 is a right side view thereof, the left side view being identical;

FIG. 5 is an enlarged, top plan view thereof, taken along lines 5-5 ofFIG. 1;

FIG. 6 is an enlarged, cross-sectional view thereof, taken along lines6-6 of FIG. 5;

FIG. 7 is a top plan view of a second embodiment of a polishing pad forsubstrate polishing apparatus, showing our new design;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a front view thereof, the rear view being identical;

FIG. 10 is a right side view thereof, the left view being identical;

FIG. 11 is an enlarged, partial top plan view thereof, taken along lines11-11 of FIG. 7; and,

FIG. 12 is an enlarged, cross-sectional view thereof, taken along lines12-12 of FIG. 11.

The dashed-dot-dashed lines represent the boundary lines of the claimeddesign. The even dashed broken lines depict environment subject matteronly and form no part of the claimed design.

CLAIM The ornamental design for a polishing pad for substrate polishingapparatus, as shown and described.